The design of the front-end layout and first high-power-density masks for the hard X-ray nano-probe beamline at SSRF
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Abstract
Background The peak power density of the hard X-ray nano-probe beamline is the highest at SSRF (Shanghai Synchrotron Radiation Facility). The peak power density of the front-end is 77.43 kW/mrad2, which is about 1.7 times higher than the others, for the fixed mask 1 (FM1) which is 11,440 mm away from the light source. However, adopting the traditional design may cause the major power absorbed by the downstream fixed mask 2 (FM2).
Purpose In order to evenly absorb the heat and ensure smooth beam transmission.
Methods The synchrotron beam tracing was performed, and the separate mask absorption approach was adopted. Additionally, finite element analysis (FEA) was conducted to analyze the thermodynamic behavior of FMs.
Result Currently, the front-end has been successfully designed and is running smoothly.
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Shuai Wu, Yun-fei Sun, Yong-jun Li, et al. The design of the front-end layout and first high-power-density masks for the hard X-ray nano-probe beamline at SSRF[J]. Radiation Detection Technology and Methods, 2024, 8(3): 1422-1429. DOI: 10.1007/s41605-024-00462-z
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Citation:
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Shuai Wu, Yun-fei Sun, Yong-jun Li, et al. The design of the front-end layout and first high-power-density masks for the hard X-ray nano-probe beamline at SSRF[J]. Radiation Detection Technology and Methods, 2024, 8(3): 1422-1429. DOI: 10.1007/s41605-024-00462-z
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Shuai Wu, Yun-fei Sun, Yong-jun Li, et al. The design of the front-end layout and first high-power-density masks for the hard X-ray nano-probe beamline at SSRF[J]. Radiation Detection Technology and Methods, 2024, 8(3): 1422-1429. DOI: 10.1007/s41605-024-00462-z
|
Citation:
|
Shuai Wu, Yun-fei Sun, Yong-jun Li, et al. The design of the front-end layout and first high-power-density masks for the hard X-ray nano-probe beamline at SSRF[J]. Radiation Detection Technology and Methods, 2024, 8(3): 1422-1429. DOI: 10.1007/s41605-024-00462-z
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