Influence analysis of surface particulate and molecular contamination in CMP process of mandrel for EP focusing mirror

Purpose To meet the stringent requirements for high-quality processing of focusing mirror molds and reproduction mirrors, specific cleaning procedures must be both accurate and efficient.
Methods This study examines the stability and consistency of the removal rate throughout the polishing process by analyzing changes in the composition of the polishing slurry at various stages. Infrared spectroscopy was used to measure the chemical groups of compounds on the mandrel surface and assess its stress state. Additionally, the adsorption mechanism at the interface was explored in detail.
Results and Conclusion The study investigates ultra-precision polishing of nickel–phosphorus alloy, focusing on factors influencing the water film formation ability on the workpiece surface. X-ray electron spectroscopy was employed to analyze the mandrel before and after the cleaning process. The effectiveness of the cleaning process was evaluated by comparing its surface removal effect with that of the polishing process.